DMD digital lithography optimization based on a hybrid genetic algorithm and improved exposure model.

An efficient method to optimize digital micromirror device (DMD) lithography was proposed using a hybrid genetic algorithm integrated with an improved exposure model. The improved exposure model significantly refines traditional approaches by incorporating advanced parameters not previously considered, including the cross-transfer coefficient, detailed light source functions, and impulse response functions. These enhancements provide a comprehensive assessment of the entire optical imaging system's impact on lithography quality and more accurately simulate the interactions of light with the photoresist.

Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique.

Due to digital micromirrors device (DMD) digital lithography limited by non-integer pixel errors, the edge smoothness of the exposed image is low and the sawtooth defects are obvious. To improve the image edge smoothness, an optimized pixel overlay method was proposed, which called the DMD digital lithography based on dynamic blur effect matching pixel overlay technology. The core of this method is that motion blur effect is cleverly introduced in the process of pixel overlap to carry out the lithography optimization experiment.

Mechanism Study of Ultrasonic Vibration-Assisted Microgroove Forming of Precise Hot-Pressed Optical Glass.

Microgroove structures with helical pitches in a wavelength level are increasingly required in optical areas. However, conventional manufacturing techniques generate relatively high stresses during pressing, resulting in poor precision when forming microgrooves. This paper reports on the mechanism of the ultrasonic vibration-assisted microgroove forming of precise hot-pressed optical glass.