Ionic Liquid-Assisted Electropolymerization for Lithographical Perfluorocarbon Deposition and Hydrophobic Patterning.

We developed a novel approach for hydrophobic patterning: combining the photolithography technique with ionic-liquid (IL)-based electropolymerization to fabricate a hydrophobic pattern. Perfluoro-functionalized 3,4-ethylenedioxythiophene (EDOT-F) dispersed in ILs was directly electropolymerized on substrates, which were patterned in advance with positive photoresists. The positive photoresists did not dissolve in ionic liquids during the electropolymerization process, and the poly(EDOT-F) film created hydrophobic domains, which resulted in hydrophobic patterning.