Flexible dispersion engineering using polymer patterning in nanophotonic waveguides.

We demonstrate the engineering of waveguide dispersion by lithographically patterning the polymer cladding on silicon nitride waveguide resonators. Both normal and anomalous dispersion, ranging from - 462 to 409 ps/nm/km, can be achieved for the same waveguide dimension within an integrated photonic chip. In the meantime, this simple process shows no impact on the waveguide loss and the quality factor of the waveguide resonators, offering flexibility in tailoring designable dispersion for a universal photonic platform.

Dispersion Engineering of Silicon Nitride Microresonators via Reconstructable SU-8 Polymer Cladding.

In this work, we propose a novel way to flexibly engineer the waveguide dispersion by patterning the cladding of waveguide microresonators. Experimentally, we demonstrate silicon nitride waveguides with air-, oxide-, and SU-8 polymer-cladding layers and compare the corresponding waveguide dispersion. By integrating SU-8 polymer as the outer cladding layer, the waveguide dispersion can be tuned from -143 to -257 ps/nm/km.