Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge.

This study aims to establish a correlation between the fragmentation process and the growth mechanisms of a coating deposited on a fluoropolymer. Deposition was carried out using dielectric barrier discharge at atmospheric pressure, employing an oxygen-containing organic precursor in a nitrogen environment. The findings reveal that the impact of precursor concentration on the formation of specific functionalities is more significant than the influence of treatment time.

Fragmentation Mechanism in a Nitrogen Dielectric Barrier Discharge Plasma on Fluoropolymer Polymer Films.

Due to their chemical inertness and low friction coefficient, fluoropolymers are today widely employed in sectors of activity as diverse and distinct as the textile industry, architectural sector, and medicine. However, their low surface energy results in poor adhesion, for example, when used for a component in a composite device with multiple other materials. Among the techniques used to enhance their adhesion, atmospheric pressure discharges provide a fast and low-cost method with a reduced environmental impact.

Micellar nanoreactors for hematin catalyzed synthesis of electrically conducting polypyrrole.

Enzymatic synthesis of doped polypyrrole (PPy) complexes using oxidoreductases (specifically peroxidases) is very well established "green" methods for producing conducting polypyrrole. The importance of this approach is realized by the numerous potential opportunities of using PPy in biological applications. However, due to very high costs and low acid stability of these enzymes, there is need for more robust alternate biomimetic catalysts.