Microsphere photolithography with dynamic angular spectra control for metasurface fabrication.

Microsphere photolithography (MPL) is a promising technique for cost-effective fabrication of large-scale metasurfaces. This approach generates an array of photonic jets by the collimated illumination of self-assembled microspheres. The photonic jets can be precisely steered within the unit cell defined by each microsphere by changing the angle of incidence.