Development of controlled nanosphere lithography technology.

This work is devoted to the development of nanosphere lithography (NSL) technology, which is a low-cost and efficient method to form nanostructures for nanoelectronics, as well as optoelectronic, plasmonic and photovoltaic applications. Creating a nanosphere mask by spin-coating is a promising, but not sufficiently studied method, requiring a large experimental base for different sizes of nanospheres. So, in this work, we investigated the influence of the technological parameters of NSL by spin-coating on the substrate coverage area by a monolayer of nanospheres with a diameter of 300 nm.

OES diagnostics as a universal technique to control the Si etching structures profile in ICP.

In this work, we demonstrate the high efficiency of optical emission spectroscopy to estimate the etching profile of silicon structures in SF/CF/O plasma. The etching profile is evaluated as a ratio of the emission intensity of the oxygen line (778.1 nm) to the fluorine lines (685.

High-temperature etching of SiC in SF/O inductively coupled plasma.

In this work, we demonstrate an effective way of deep (30 µm depth), highly oriented (90° sidewall angle) structures formation with sub-nanometer surface roughness (R = 0.7 nm) in silicon carbide (SiC). These structures were obtained by dry etching in SF/O inductively coupled plasma (ICP) at increased substrate holder temperatures.

Fast and Controllable Synthesis of Core-Shell FeO-C Nanoparticles by Aerosol CVD.

A method for simple and fast (30-60 s) synthesis of spherical "FeO core-carbon shell" structures by atmospheric pressure aerosol pyrolysis of benzoic acid in dimethylformamide solutions containing dispersed FeO nanoparticles is described. It has been experimentally shown that it is possible to control both the size of the core-shell particles and the size of FeO grains and their amount in the particle core by the variation of benzoic acid concentration in solution and using pre-stabilized by mannitol iron oxide nanoparticles. It has been found that particles with an average size of 250-350 nm are formed at the concentration of benzoic acid in the range 0.

TOF MS Investigation of Nickel Oxide CVD.

NiO layers were deposited by metal-organic chemical vapor deposition using bis-(ethylcyclopentadienyl) nickel (EtCp)Ni and oxygen or ozone. As a continuation of kinetic study of NiO MOCVD the gas-phase, transformations of (EtCp)Ni were studied in the temperature range of 380-830 K. Time of reactions corresponding to the residence time of the gas stream in hot zone of the reactor was about 0.

Chain Assemblies from Nanoparticles Synthesized by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition: The Computational View.

This article refers to the computational study of nanoparticle self-organization on the solid-state substrate surface with consideration of the experimental results, when nanoparticles were synthesised during atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD). The experimental study of silicon dioxide nanoparticle synthesis by AP-PECVD demonstrated that all deposit volume consists of tangled chains of nanoparticles. In certain cases, micron-sized fractals are formed from tangled chains due to deposit rearrangement.