Automated measurement and analysis of sidewall roughness using three-dimensional atomic force microscopy.

As semiconductor device architecture develops, from planar field-effect transistors (FET) to FinFET and gate-all-around (GAA), there is an increased need to measure 3D structure sidewalls precisely. Here, we present a 3-Dimensional Atomic Force Microscope (3D-AFM), a powerful 3D metrology tool to measure the sidewall roughness (SWR) of vertical and undercut structures. First, we measured three different dies repeatedly to calculate reproducibility in die level.

"Multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography.

Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip-based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. Here, polymer pen lithography is demonstrated with a novel leveling method to account for the magnitude and direction of the total applied force of tip arrays by a multipoint force sensing structure integrated into the tip holder.

Direct-write patterning of bacterial cells by dip-pen nanolithography.

The ability of dip-pen nanolithography (DPN) to generate nano- or microarrays of soft or hard materials (e.g., small molecules, DNA, proteins, nanoparticles, sols, and polymers) in a direct-write manner has been widely demonstrated.

Fabrication of pseudo-crystal nanostructures of TiO2 particles under UV-irradiation.

Colloidal titanium dioxide (TiO2) suspensions were synthesized by hydrolysis of titanium isopropoxide in the presence of acetic acid. When TiO2 colloids were subjected to bandgap excitation (ultraviolet [UV] irradiation), the colloidal solution exhibited yellow coloration, leading to the trapping of holes and electrons on the particle surfaces. The absorption spectra indicated a distinct absorption band in the UV and visible region.