Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer.

Micro- and nanopatterned surfaces are highly useful as functional surfaces and in the fabrication of electronic and optical devices. Transferring high-resolution patterns into a photoresistive layer or the substrate surface is a crucial step in fabricating a nanostructure with gratings, pillar arrays, and hole arrays. In this work, a very simple yet efficient and high-throughput route for pattern transfer was investigated based on the self-assembly of block copolymers (BCPs).