Publications by authors named "Sebastian Lellig"
Article Synopsis
- The study compares the oxidation resistance of HfB and HfAlB thin films at 700 °C over 8 hours, showing that HfAlB has significantly better performance with an oxide scale thickness only 14% of that of HfB after oxidation.
- The improved oxidation resistance of HfAlB is attributed to its dense, primarily amorphous oxide scale, which includes Hf, Al, and B, reducing oxidation kinetics due to passivation.
- HfAlB outperforms similar Ti-Al-based boride and nitride thin films, with reductions in oxide scale thickness of 21% compared to TiAlB and 47% compared to TiAlN, demonstrating effective oxidation resistance despite its
