Publications by authors named "Sarai Zarate-Galvez"
Materials (Basel)
February 2020
Article Synopsis
- The study focuses on analyzing the atomic composition of amorphous SiGe:H films created using low-temperature RF plasma discharge.
- Researchers investigated how hydrogen dilution affects the ratios of silicon and germanium in these films and noted variations in germanium content based on different hydrogen levels.
- Findings reveal that lower hydrogen dilution favors silicon atom termination, while higher levels favor germanium termination, with a balanced bond formation occurring at intermediate dilution rates.
