Conformal atomic layer deposition of RuOon highly porous current collectors for micro-supercapacitor applications.

3D porous electrodes have been considered as a new paradigm shift for increasing the energy storage of pseudocapacitive micro-supercapacitors for on-chip electronics. However, the conformal deposition of active materials is still challenging when highly porous structures are involved. In this work, we have investigated the atomic layer deposition (ALD) of ruthenium dioxide RuOon porous Au and Pt architectures prepared by hydrogen bubble templated electrodeposition, with area enlargement factors ranging from 400 to 10 000 cm/cm.