Effect of thickness on the dielectric properties and glass transition of plasma poly(ethylene oxide) thin films.

Plasma poly(ethylene oxide) thin films at different thicknesses of 20, 100, 250, 500 nm were deposited by plasma-assisted physical vapor deposition on glass substrates between aluminum electrodes in capacitor form at 5 W plasma discharge power. The structural analyses were performed by Fourier transform in7frared spectroscopy. The dielectric properties such as dielectric constant κ and electric modulus M were defined by dielectric spectroscopy measurements.