Research (Wash D C)
August 2024
Despite the intensive research in room-temperature phosphorescent (RTP) polymers, the synthesis of RTP polymers with well-defined macromolecular structures and multiple functions remains a challenge. Herein, reversible deactivation radical polymerization was demonstrated to offer a gradient copolymer (GCP) architecture with controlled heterogeneities, which combines hard segment and flexible segment. The GCPs would self-assemble into a multiphase nanostructure, featuring tunable stretchability, excellent RTP performance, and intrinsic healability without compromising light emission under stretching.
View Article and Find Full Text PDFAngew Chem Int Ed Engl
September 2023
Traditional mechanochemically controlled reversible-deactivation radical polymerization (RDRP) utilizes ultrasound or ball milling to regenerate activators, which induce side reactions because of the high-energy and high-frequency stimuli. Here, we propose a facile approach for tribochemically controlled atom transfer radical polymerization (tribo-ATRP) that relies on contact-electro-catalysis (CEC) between titanium oxide (TiO ) particles and CuBr /tris(2-pyridylmethylamine (TPMA), without any high-energy input. Under the friction induced by stirring, the TiO particles are electrified, continuously reducing CuBr /TPMA into CuBr/TPMA, thereby conversing alkyl halides into active radicals to start ATRP.
View Article and Find Full Text PDFHigh-quality and free-standing polyimide (PI) film with desirable mechanical properties and uniformity is in high demand due to its widespread applications in highly precise flexible and chip-integrated sensors. In this study, a free-standing PI film with high toughness was successfully prepared using a diamine monomer with ether linkages. The prepared PI films exhibited significantly superior mechanical properties compared to PI films of the same molecular structure, which can be attributed to the systematic exploration of the film-forming process.
View Article and Find Full Text PDFSynthesis of large-area patterned MoS is considered the principle base for realizing high-performance MoS -based flexible electronic devices. Patterning and transferring MoS films to target flexible substrates, however, require conventional multi-step photolithography patterning and transferring process, despite tremendous progress in the facilitation of practical applications. Herein, an approach to directly synthesize large-scale MoS patterns that combines inkjet printing and thermal annealing is reported.
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