Resolving the Atomic Structure of Sequential Infiltration Synthesis Derived Inorganic Clusters.

Sequential infiltration synthesis (SIS) is a route to the precision deposition of inorganic solids in analogy to atomic layer deposition but occurs within (vs upon) a soft material template. SIS has enabled exquisite nanoscale morphological complexity in various oxides through selective nucleation in block copolymers templates. However, the earliest stages of SIS growth remain unresolved, including the atomic structure of nuclei and the evolution of local coordination environments, before and after polymer template removal.

The chemical physics of sequential infiltration synthesis-A thermodynamic and kinetic perspective.

Sequential infiltration synthesis (SIS) is an emerging materials growth method by which inorganic metal oxides are nucleated and grown within the free volume of polymers in association with chemical functional groups in the polymer. SIS enables the growth of novel polymer-inorganic hybrid materials, porous inorganic materials, and spatially templated nanoscale devices of relevance to a host of technological applications. Although SIS borrows from the precursors and equipment of atomic layer deposition (ALD), the chemistry and physics of SIS differ in important ways.

Atomic layer deposition for membrane interface engineering.

In many applications, interfaces govern the performance of membranes. Structure, chemistry, electrostatics, and other properties of interfaces can dominate the selectivity, flux, fouling resistance, and other critical aspects of membrane functionality. Control over membrane interfacial properties, therefore, is a powerful means of tailoring performance.

Crude-Oil-Repellent Membranes by Atomic Layer Deposition: Oxide Interface Engineering.

Crude oil fouling on membrane surfaces is a persistent, crippling challenge in oil spill remediation and oilfield wastewater treatment. In this research, we present how a nanosized oxide coating can profoundly affect the anti-crude-oil property of membrane materials. Select oxide coatings with a thickness of ∼10 nm are deposited conformally on common polymer membrane surfaces by atomic layer deposition to significantly mitigate fouling during filtration processes.