Double-exposure phase calculation method in electronic speckle pattern interferometry based on holographic object illumination.

Multiple-exposure phase calculation procedures are widely used in electronic speckle pattern interferometry to calculate phase maps of displacements. We developed a double-exposure process based on holographic illumination of the object and the idea of the spatial carrier phase-shifting method to examine transient displacements. In our work, computer-generated holograms and a spatial light modulator were used to generate proper coherent illuminating masks.