Enhanced Light Trapping in GaAs/TiO-Based Photocathodes for Hydrogen Production.

Photoelectrochemical cells (PEC) are appealing devices for the production of renewable energy carriers. In this context, III-V semiconductors such as GaAs are very promising materials due to their tunable band gaps, which can be appropriately adjusted for sunlight harvesting. Because of the high cost of these semiconductors, the nanostructuring of the photoactive layer can help to improve the device efficiency as well as drastically reduce the amount of material needed.

Background-Free Near-Infrared Biphoton Emission from Single GaAs Nanowires.

The generation of photon pairs from nanoscale structures with high rates is still a challenge for the integration of quantum devices, as it suffers from parasitic signals from the substrate. In this work, we report type-0 spontaneous parametric down-conversion at 1550 nm from individual bottom-up grown zinc-blende GaAs nanowires with lengths of up to 5 μm and diameters of up to 450 nm. The nanowires were deposited on a transparent ITO substrate, and we measured a background-free coincidence rate of 0.

Growing self-assisted GaAs nanowires up to 80m long by molecular beam epitaxy.

Ultralong GaAs nanowires were grown by molecular beam epitaxy using the vapor-liquid-solid method. In this ultralong regime we show the existence of two features concerning the growth kinetic and the structural properties. Firstly, we observed a non-classical growth mode, where the axial growth rate is attenuated.

Highly linear polarized emission at telecom bands in InAs/InP quantum dot-nanowires by geometry tailoring.

Nanowire (NW)-based opto-electronic devices require certain engineering in the NW geometry to realize polarized-dependent light sources and photodetectors. We present a growth procedure to produce InAs/InP quantum dot-nanowires (QD-NWs) with an elongated top-view cross-section relying on the vapor-liquid-solid method using molecular beam epitaxy. By interrupting the rotation of the sample during the radial growth sequence of the InP shell, hexagonal asymmetric (HA) NWs with long/short cross-section axes were obtained instead of the usual symmetrical shape.

Wurtzite phase control for self-assisted GaAs nanowires grown by molecular beam epitaxy.

The accurate control of the crystal phase in III-V semiconductor nanowires (NWs) is an important milestone for device applications. Although cubic zinc-blende (ZB) GaAs is a well-established material in microelectronics, the controlled growth of hexagonal wurtzite (WZ) GaAs has thus far not been achieved successfully. Specifically, the prospect of growing defect-free and gold catalyst-free wurtzite GaAs would pave the way towards integration on silicon substrate and new device applications.

Density-controlled growth of vertical InP nanowires on Si(111) substrates.

A procedure to achieve the density-controlled growth of gold-catalyzed InP nanowires (NWs) on (111) silicon substrates using the vapor-liquid-solid method by molecular beam epitaxy is reported. We develop an effective and mask-free method based on controlling the number and the size of the Au-In catalyst droplets in addition to the conditions for the NW nucleation. We show that the NW density can be tuned with values in the range of 18 µm to <0.

Crystal phase engineering of self-catalyzed GaAs nanowires using a RHEED diagram.

It is well known that the crystalline structure of the III-V nanowires (NWs) is mainly controlled by the wetting contact angle of the catalyst droplet which can be tuned by the III and V flux. In this work we present a method to control the wurtzite (WZ) or zinc-blende (ZB) structure in self-catalyzed GaAs NWs grown by molecular beam epitaxy, using reflection high energy electron diffraction (RHEED) diagram analysis. Since the diffraction patterns of the ZB and WZ structures differ according to the azimuth [11̄0], it is possible to follow the evolution of the intensity of specific ZB and WZ diffraction spots during NW growth as a function of the growth parameters such as the Ga flux.

InAs quantum dot in a needlelike tapered InP nanowire: a telecom band single photon source monolithically grown on silicon.

Realizing single photon sources emitting in the telecom band on silicon substrates is essential to reach complementary-metal-oxide-semiconductor (CMOS) compatible devices that secure communications over long distances. In this work, we propose the monolithic growth of needlelike tapered InAs/InP quantum dot-nanowires (QD-NWs) on silicon substrates with a small taper angle and a nanowire diameter tailored to support a single mode waveguide. Such a NW geometry is obtained by a controlled balance over axial and radial growths during the gold-catalyzed growth of the NWs by molecular beam epitaxy.

Impact of the Ga flux incidence angle on the growth kinetics of self-assisted GaAs nanowires on Si(111).

In this work we show that the incidence angle of group-III element fluxes plays a significant role in the diffusion-controlled growth of III-V nanowires (NWs) by molecular beam epitaxy (MBE). We present a thorough experimental study on the self-assisted growth of GaAs NWs by using a MBE reactor equipped with two Ga cells located at different incidence angles with respect to the surface normal of the substrate, so as to ascertain the impact of such a parameter on the NW growth kinetics. The as-obtained results show a dramatic influence of the Ga flux incidence angle on the NW length and diameter, as well as on the shape and size of the Ga droplets acting as catalysts.

Growth optimization and characterization of regular arrays of GaAs/AlGaAs core/shell nanowires for tandem solar cells on silicon.

With a band gap value of 1.7 eV, AlGaAs is one of the ideal III-V alloys for the development of nanowire-based Tandem Solar Cells on silicon. Nevertheless, growing self-catalysed AlGaAs nanowires on silicon by solid-source molecular beam epitaxy is a very difficult task due to the oxidation of Al adatoms by the SiO layer present on the surface.

Nanoscale investigation of a radial p-n junction in self-catalyzed GaAs nanowires grown on Si (111).

One obstacle for the development of nanowire (NW) solar cells is the challenge to assess and control their nanoscale electrical properties. In this work a top-cell made of p-n GaAs core/shell NWs grown on a Si(111) substrate by Molecular Beam Epitaxy (MBE) is investigated by high resolution charge collection microscopy. Electron Beam Induced Current (EBIC) analyses of single NWs have validated the formation of a homogeneous radial p-n junction over the entire length of the NWs.

Fabrication of self-rolling geodesic objects and photonic crystal tubes.

This paper presents a stress engineering method that allows the design and fabrication of the analogs of single-wall nanotubes in the class of photonic crystals. The macroscopic shape of the final object is obtained through the stress relaxation of a pre-stressed multilayer planar design. We illustrate the extent of the proposed method by various single-layer and multilayer photonic crystals tubes and micron-scale objects with 5-fold symmetry.

Thermoelectric La-doped SrTiO epitaxial layers with single-crystal quality: from nano to micrometers.

High-quality thermoelectric LaSrTiO (LSTO) films, with thicknesses ranging from 20 nm to 0.7 μm, have been epitaxially grown on SrTiO(001) substrates by enhanced solid-source oxide molecular-beam epitaxy. All films are atomically flat (with rms roughness < 0.

GaAs nanowires with oxidation-proof arsenic capping for the growth of an epitaxial shell.

We propose an arsenic-capping/decapping method, allowing the growth of an epitaxial shell around the GaAs nanowire (NW) core which is exposed to an ambient atmosphere, and without the introduction of impurities. Self-catalyzed GaAs NW arrays were firstly grown on Si(111) substrates by solid-source molecular beam epitaxy. Aiming for protecting the active surface of the GaAs NW core, the arsenic-capping/decapping method has been applied.

GaAs Core/SrTiO3 Shell Nanowires Grown by Molecular Beam Epitaxy.

We have studied the growth of a SrTiO3 shell on self-catalyzed GaAs nanowires grown by vapor-liquid-solid assisted molecular beam epitaxy on Si(111) substrates. To control the growth of the SrTiO3 shell, the GaAs nanowires were protected using an arsenic capping/decapping procedure in order to prevent uncontrolled oxidation and/or contamination of the nanowire facets. Reflection high energy electron diffraction, scanning electron microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy were performed to determine the structural, chemical, and morphological properties of the heterostructured nanowires.

Redshifted and blueshifted photoluminescence emission of InAs/InP quantum dots upon amorphization of phase change material.

We present the mechanisms underlying the redshifted and blueshifted photoluminescence (PL) of quantum dots (QDs) upon amorphization of phase change material (PCM). We calculated the stress and energy shift distribution induced by volume expansion using finite element method. Simulation result reveals that redshift is obtained beneath the flat part of amorphous mark, while blueshift is obtained beneath the edge region of amorphous mark.

Unidirectional III-V microdisk lasers heterogeneously integrated on SOI.

We demonstrate unidirectional bistability in microdisk lasers electrically pumped and heterogeneously integrated on SOI. The lasers operate in continuous wave regime at room temperature and are single mode. Integrating a passive distributed Bragg reflector (DBR) on the waveguide to which the microdisk is coupled feeds laser emission back into the laser cavity.

Uniformity of the lasing wavelength of heterogeneously integrated InP microdisk lasers on SOI.

We report a high lasing wavelength uniformity of optically pumped InP-based microdisk lasers processed with electron-beam lithography, heterogeneously integrated with adhesive bonding on silicon-on-insulator (SOI) waveguide circuits and evanescently coupled to an underlying waveguide. We study the continuous wave laser emission coupling out of the SOI via a grating coupler etched at one side of the waveguide, and demonstrate a standard deviation in lasing wavelength of nominally identical devices on the same chip lower than 500 pm. The deviation in the diameter of the microdisks as low as a few nanometers makes all-optical signal processing applications requiring cascadability possible.

InGaAs quantum dots grown by molecular beam epitaxy for light emission on Si substrates.

The aim of this study is to achieve homogeneous, high density and dislocation free InGaAs quantum dots grown by molecular beam epitaxy for light emission on silicon substrates. This work is part of a project which aims at overcoming the severe limitation suffered by silicon regarding its optoelectronic applications, especially efficient light emission device. For this study, one of the key points is to overcome the expected type II InGaAs/Si interface by inserting the InGaAs quantum dots inside a thin silicon quantum well in SiO2 fabricated on a SOI substrate.

10 Gbit/s all-optical NRZ-OOK to RZ-OOK format conversion in an ultra-small III-V-on-silicon microdisk fabricated in a CMOS pilot line.

We report the demonstration of an all-optical, bias free and error-free (bit-error-rate ~10(-12)), 10 Gbit/s non-return-to-zero (NRZ) to return-to-zero (RZ) data format conversion using a 7.5 µm diameter III-V-on-silicon microdisk resonator. The device is completely processed in a 200 mm CMOS pilot line.

Milliwatt-level fiber-coupled laser power from photonic crystal band-edge laser.

We report unprecedentedly high output powers measured from large area two-dimensional square-lattice photonic-crystal band-edge lasers (BELs), patterned by holographic lithography. In order to ensure mechanical rigidity, the BELs were fabricated in an InP-based epilayer bonded onto a fused silica substrate beforehand. The BEL devices, employing the surface-emitting Γ-point monopole band-edge mode, provide a fiber-coupled single mode output power as high as 2.

Subwavelength plasmonic lasing from a semiconductor nanodisk with silver nanopan cavity.

We report the experimental demonstration of an optically pumped silver-nanopan plasmonic laser with a subwavelength mode volume of 0.56(lambda/2n)(3). The lasing mode is clearly identified as a whispering-gallery plasmonic mode confined at the bottom of the silver nanopan from measurements of the spectrum, mode image, and polarization state, as well as agreement with numerical simulations.

Room temperature low-threshold InAs/InP quantum dot single mode photonic crystal microlasers at 1.5 microm using cavity-confined slow light.

We have designed, fabricated, and characterized an InP photonic crystal slab structure that supports a cavity-confined slow-light mode, i.e. a bandgap-confined valence band-edge mode.

Carrier-injection-based electro-optic modulator on silicon-on-insulator with a heterogeneously integrated III-V microdisk cavity.

A compact electro-optic modulator on silicon-on-insulator is presented. The structure consists of a III-V microdisk cavity heterogeneously integrated on a silicon-on-insulator wire waveguide. By modulating the loss of the active layer included in the cavity through carrier injection, the power of the transmitted light at the resonant wavelength is modulated; approximately 10 dB extinction ratio and 2.

Ultimate vertical Fabry-Perot cavity based on single-layer photonic crystal mirrors.

Vertical Fabry Perot cavities (VFPC) have been extensively studied, especially for the realization of vertical-cavity surface emitting lasers (VCSELs). They are traditionally composed of two Distributed Bragg Reflectors (DBR) which reflectivity has to be sufficient in order to obtain highly resonant cavity, which is particularly necessary for laser emission in VCSELs. As a consequence, DBRs consist generally in very thick layer stacks.