Continuous Large Area Monolayered Molybdenum Disulfide Growth Using Atmospheric Pressure Chemical Vapor Deposition.

The growth of large crystallite continuous monolayer materials like molybdenum disulfide (MoS) with the desired morphology via chemical vapor deposition (CVD) remains a challenge. In CVD, the complex interplay of various factors like growth temperatures, precursors, and nature of the substrate decides the crystallinity, crystallite size, and coverage area of the grown MoS monolayer. In the present work, we report about the role of weight fraction of molybdenum trioxide (MoO), sulfur, and carrier gas flow rate toward nucleation and monolayer growth.