All-Dielectric Transreflective Angle-Insensitive Near-Infrared (NIR) Filter.

This paper presents an all-dielectric, cascaded, multilayered, thin-film filter, allowing near-infrared filtration for spectral imaging applications. The proposed design is comprised of only eight layers of amorphous silicon (A-Si) and silicon nitride (Si3N4), successively deposited on a glass substrate. The finite difference time domain (FDTD) simulation results demonstrate a distinct peak in the near-infrared (NIR) region with transmission efficiency up to 70% and a full-width-at-half-maximum (FWHM) of 77 nm.