Nanoparticle assembly by transient topography induced by applying soft lithography to block copolymer films.

We present a simple approach for patterning metal nanoparticles into periodic superstructures on flat films spanning centimeter-square areas. Our approach is based on capillary force lithography, a soft lithography method that is used to impart topography to molten polymer films, and applies it to block copolymer films to obtain substrates featuring both topographic and chemical contrasts that can serve as templates for the selective deposition of nanoparticles. Here we show that flattening the films by exposure to solvent vapour prior to nanoparticle deposition not only retains chemical heterogeneity but also provides access to unique hierarchically-organized nanoparticle superstructures that are unattainable by other methods.

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement.

Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting.

Coupling the chemistry and topography of block copolymer films patterned by soft lithography for nanoparticle organization.

Soft lithography techniques have become leading mesoscale approaches for replicating topographic features in polymer films. So far, modified polymer films formed by soft lithography only featured topographic heterogeneity. Here we demonstrate the application of soft lithography techniques to block copolymer films, and show that the preferential affinity of one of the blocks to the stamping material leads to chemical heterogeneity that corresponds to the topographic features.

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature.

The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile.

Assembly of Semiconductor Nanorods into Circular Arrangements Mediated by Block Copolymer Micelles.

The collective properties of ordered ensembles of anisotropically shaped nanoparticles depend on the morphology of organization. Here, we describe the utilization of block copolymer micelles to bias the natural packing tendency of semiconductor nanorods and organize them into circularly arranged superstructures. These structures are formed as a result of competition between the segregation tendency of the nanorods in solution and in the polymer melt; when the nanorods are highly compatible with the solvent but prefer to segregate in the melt to the core-forming block, they migrate during annealing toward the core-corona interface, and their superstructure is, thus, templated by the shape of the micelle.