Effects of interface-engineering on the internal structure and reflective characteristics of Cr/Sc multilayer mirrors.

Record reflectivity's of R=23.8% at 3.14 nm and R=30.

Stress, reflectance, and stability of Ru/Be multilayer coatings with Mo interlayers near the 11 nm wavelength.

The stress, reflectance, and temporal stability of Ru/Be multilayer mirrors, both with and without Mo interlayers, were studied. A Ru/Be MLM was found to have zero stress at a Ru layer thickness-to-period ratio of γ ∼ 0.4.

Investigation of structural and reflective characteristics of short-period Mo/BC multilayer X-ray mirrors.

The results of a study of the structural and reflective characteristics of short-period multilayer X-ray mirrors based on Mo/BC at wavelengths 1.54 Å, 9.89 Å and 17.

Be/Si/Al multilayer mirrors as the most promising optical elements for spectroscopy and imaging in the spectral region of 17-32 nm.

The reflective and structural parameters of Be/Si/Al multilayer mirrors have been studied. The extent of stability of their X-ray optical characteristics has been demonstrated during storage in air for 4 years and during vacuum annealing at temperatures up to 100°C. A high reflectance of 62.

High-aperture EUV microscope using multilayer mirrors and a 3D reconstruction algorithm based on z-tomography.

The article is devoted to the development of an EUV microscope using a wavelength of 13.84 nm. Due to the use of a mirror lens with a large numerical aperture, NA = 0.