Publications by authors named "R J Phaneuf"

Double and triple detachment of the F^{-}(1s^{2}2s^{2}2p^{6}) negative ion by a single photon have been investigated in the photon energy range 660 to 1000 eV. The experimental data provide unambiguous evidence for the dominant role of direct photodouble detachment with a subsequent single-Auger process in the reaction channel leading to F^{2+} product ions. Absolute cross sections were determined for the direct removal of a (1s+2p) pair of electrons from F^{-} by the absorption of a single photon.

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We present the results of investigations aimed at understanding the mechanisms by which small, mutually immiscible organic molecules self-assemble into domains during phase separation from liquid solutions in the presence of a solid substrate. As an example system, we investigated molecular mixtures of tetranitro zinc-phthalocyanine (tn-ZnPc), an electron donor, and [6,6]-phenyl-C-butyric acid methyl ester (PCBM), an electron acceptor, in chloroform solution, deposited onto native oxide-covered Si(111) substrates. We found qualitatively different behavior in the formation of domains of the two types of molecules, seemingly because of a large difference in their solubilities in the solvent.

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We present results demonstrating directed self-assembly of nanometer-scale mounds during molecular beam epitaxial growth on patterned GaAs (001) surfaces. The mound arrangement is tunable via the growth temperature, with an inverse spacing or spatial frequency which can exceed that of the features of the template. We find that the range of film thickness over which particular mound arrangements persist is finite, due to an evolution of the shape of the mounds which causes their growth to self-limit.

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We report on factors affecting the performance of a broadband, mid-IR absorber based on multiple, alternating dielectric / metal layers. In particular, we investigate the effect of interface roughness. Atomic layer deposition produces both a dramatic suppression of the interface roughness and a significant increase in the optical absorption as compared to devices fabricated using a conventional thermal evaporation source.

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We have obtained experimental photo-double- and photo-triple-detachment cross sections for the fullerene negative ion using Advanced Light Source photons of 17-90 eV. The cross sections are 2 and 2.5 times larger than those for C60 and appear to be compressed and shifted in photon energy as compared to C60.

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