The Physikalisch-Technische Bundesanstalt (PTB) has a long tradition in the calibration of radiation sources in the ultraviolet and vacuum ultraviolet spectral range, with traceability to calculable synchrotron radiation. Within this context, new instrumentation in the PTB laboratory at the Metrology Light Source (MLS) has been put into operation that opens up extended and improved calibration possibilities. A new facility for radiation source calibrations has been set up in the spectral range from 7 nm to 400 nm based on a combined normal incidence-grazing incidence monochromator.
View Article and Find Full Text PDFA novel ultra-high vacuum instrument for X-ray reflectometry and spectrometry-related techniques for nanoanalytics by means of synchrotron radiation has been constructed and commissioned. This versatile instrument was developed by the Physikalisch-Technische Bundesanstalt, Germany's national metrology institute, and includes a 9-axis manipulator that allows for an independent alignment of the samples with respect to all degrees of freedom. In addition, a rotational and translational movement of several photodiodes as well as a translational movement of an aperture system in and out of the beam is provided.
View Article and Find Full Text PDFWe present the analytical features and performance of an x-ray spectroscopy end station of moderate energy resolution operating with proton-induced quasi-monochromatic x-ray beams. The apparatus was designed, installed and operated at the 5.5 MV Tandem VdG Accelerator Laboratory of the Institute of Nuclear Physics, N.
View Article and Find Full Text PDFTotal reflection X-ray fluorescence (TXRF) analysis is a well-established method to monitor lowest level contamination on semiconductor surfaces. Even light elements on a wafer surface can be excited effectively when using high-flux synchrotron radiation in the soft X-ray range. To meet current industrial requirements in nondestructive semiconductor analysis, the Physikalisch-Technische Bundesanstalt (PTB) operates dedicated instrumentation for analyzing light element contamination on wafer pieces as well as on 200- and 300-mm silicon wafer surfaces.
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