Publications by authors named "Qiu-ming Fu"
[Effect of Helium on Diamond Films Deposited Using Microwave PCVD].
Guang Pu Xue Yu Guang Pu Fen Xi
March 2015
Article Synopsis
- Optical emission spectroscopy (OES) was utilized to analyze the impact of helium on diamond growth in a CH4-H2-He plasma during microwave plasma chemical vapor deposition (MPCVD).
- The study found that increasing helium volume fractions enhanced the intensity of certain radicals, notably H(α), and improved the deposition rate of diamond films by 24%.
- However, higher helium levels led to a decrease in the uniformity of certain radicals, changed the crystallite orientation of the diamond films, and increased secondary nucleation density due to the higher concentration of C2 radicals.