Theoretical modeling and analysis of material removal characteristics for KDP crystal in abrasive-free jet processing.

Traditional KDP polishing methods, such as magnetorheological finishing (MRF), ion-beam figuring (IBF), and chemical mechanical polishing (CMP), are limited by either hard-to-remove residual particles, unavoidable heating effect, or applicability that is restricted to large-sized KDP. The abrasive-free jet polishing (AFJP) is regarded as a promising polishing method that can circumvent the above issues. KDP AFJP makes use of a thermodynamically and kinetically stable ionic liquid (IL) microemulsion that contains nanometer range water droplets evenly dispersed in the non-aqueous carrier liquid.