Small random library method combined with local searching in optical critical dimension measurements.

The critical dimensions (CDs) of gratings significantly influence their optical performances and require high-resolution measurements. To avoid damaging the gratings, a model-based optical critical dimension (OCD) measurement method utilizing ellipsometry or scatterometry was applied by matching the simulated and experimental values. However, online CD measurements during grating fabrication require a bulky presimulated library containing the condition points with various CDs, making it time consuming and resource intensive to build with large dimension ranges to account for grating fabrication errors.