We report on measurements of the diffraction efficiency of 200-nm-period freestanding blazed transmission gratings for wavelengths in the 0.96 to 19.4 nm range.
View Article and Find Full Text PDFWe demonstrate complete fabrication process integration and device performance of sturdy, self-supported transmission gratings in silicon. Gratings are patterned with nanoimprint lithography and aluminum liftoff on silicon-on-insulator wafers. Double-sided deep reactive ion etching (DRIE) creates freestanding 120 nm half-pitch gratings with 2000 nm depth and built-in 1 mm pitch bulk silicon support structures.
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