Ultra-shallow p-type doping of silicon by performing atomic layer deposition of AlO thin films onto SiO/Si.

We report an ultra-shallow p-type doping of silicon resulting from the rapid thermal annealing of thin AlO films deposited on intrinsic silicon with a native SiO layer, using a common atomic layer deposition process. Characterization revealed a two-stage decrease in sheet resistance, providing insights into the doping mechanism.

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da).

Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate patterning performance of a resist in lithography is limited because of the trade-off between resolution, line-width roughness, and sensitivity; improving one or two of these parameters typically leads to a loss in the third. As the patterned feature sizes approach angstrom scale, the trade-off between these three metrics becomes increasingly hard to resolve and calls for a fundamental rethinking of the resist chemistry.

Resistless EUV lithography: Photon-induced oxide patterning on silicon.

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its high resolution and throughput, but future progress in resolution can be hampered because of the inherent limitations of the resists. We show that EUV photons can induce surface reactions on a partially hydrogen-terminated silicon surface and assist the growth of an oxide layer, which serves as an etch mask.

Chirality Nanosensor with Direct Electric Readout by Coupling of Nanofloret Localized Plasmons with Electronic Transport.

The detection of enantiopurity for small sample quantities is crucial, particularly in the pharmaceutical industry; however, existing methodologies rely on specific chiral recognition elements, or complex optical systems, limiting its utility. A nanoscale chirality sensor, for continuously monitoring molecular chirality using an electric circuit readout, is presented. This device design represents an alternative real-time scalable approach for chiral recognition of small quantity samples (less than 10 adsorbed molecules).