A generic "micro-Stoney" method for the measurement of internal stress and elastic modulus of ultrathin films.

Accurate measurement of the mechanical properties of ultra-thin films with thicknesses typically below 100 nm is a challenging issue with an interest in many fields involving coating technologies, microelectronics, and MEMS. A bilayer curvature based method is developed for the simultaneous determination of the elastic mismatch strain and Young's modulus of ultra-thin films. The idea is to deposit the film or coating on very thin cantilevers in order to amplify the curvature compared to a traditional "Stoney" wafer curvature test, hence the terminology "micro-Stoney.