Currently, researchers spend significant time manually searching through large volumes of data produced during scanning probe imaging to identify specific patterns and motifs formed via self-assembly and self-organization. Here, we use a combination of Monte Carlo simulations, general statistics, and machine learning to automatically distinguish several spatially correlated patterns in a mixed, highly varied data set of real AFM images of self-organized nanoparticles. We do this regardless of feature-scale and without the need for manually labeled training data.
View Article and Find Full Text PDFWe have controllably positioned, with nanometre precision, single CdSe quantum dots referenced to a registration template such that the location of a given nanoparticle on a macroscopic (≈1 cm(2)) sample surface can be repeatedly revisited. The atomically flat sapphire substrate we use is particularly suited to optical measurements of the isolated quantum dots, enabling combined manipulation-spectroscopy experiments on a single particle. Automated nanoparticle manipulation and imaging routines have been developed so as to facilitate the rapid assembly of specific nanoparticle arrangements.
View Article and Find Full Text PDFWe present a new methodology, based on a combination of genetic algorithms and image morphometry, for matching the outcome of a Monte Carlo simulation to experimental observations of a far-from-equilibrium nanosystem. The Monte Carlo model used simulates a colloidal solution of nanoparticles drying on a solid substrate and has previously been shown to produce patterns very similar to those observed experimentally. Our approach enables the broad parameter space associated with simulated nanoparticle self-organization to be searched effectively for a given experimental target morphology.
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