We present a new and efficient cobalt precursor, Co(DMOCHCOCF), to prepare CoO thin films and conformal coatings. In the synthesis of this Co complex, heteroaryl moieties and CF-groups were combined leading to the precursor with high thermal stability and volatility. The suitability of this precursor for ALD deposition was tested on flat silicon substrates and TiO/C nanofibers upon process optimization.
View Article and Find Full Text PDF© LitMetric 2025. All rights reserved.