Effects of optical activity to Mueller matrix ellipsometry of composed waveplates.

Mueller matrix ellipsometry has been used to precisely characterize quartz waveplates for demanding applications in the semiconductor industry and high precision polarimetry. We have found this experimental technique to be beneficial to use because it enables us to obtain absolute and precise measurement of retardation in a wide spectral range, waveplate orientation, and compound waveplate adjustment. In this paper, the necessity of including the optical activity in the Mueller matrix model and data treatment is demonstrated.