An Experimental Study of Dislocation Dynamics in GaN.

The dynamics of dislocations introduced through indentation or scratching at room temperature into a few GaN layers that were grown using the HVPE, MOCVD and ELOG methods and had different dislocation densities were studied via the electron-beam-induced current and cathodoluminescence methods. The effects of thermal annealing and electron beam irradiation on dislocation generation and multiplication were investigated. It is shown that the Peierls barrier for dislocation glide in GaN is essentially lower than 1 eV; thus, it is mobile even at room temperature.