Publications by authors named "Patrick Poveda"
Article Synopsis
- Researchers developed single crystalline FeCo nanostars using a straightforward organometallic method, which allowed for direct synthesis without needing a complicated seed-mediated growth process.* -
- The nanostars are made up of 8 tetrahedrons and showcase high magnetization levels similar to bulk materials, measured at 235 A·m·kg.* -
- Advanced imaging techniques revealed complex 3D spin configurations influenced by both dipolar and exchange interactions, highlighting how the unique shape of these nanostars can significantly alter their magnetic properties.*
Article Synopsis
- * The type of ligands used in the synthesis significantly influenced the reactivity of the precursors and the resulting chemical structure of the nanoparticles.
- * This synthesis method achieved the formation of a B2 short-range order in FeCo nanoparticles without needing any additional annealing process, resulting in strong magnetic properties and successful applications in inductor-based filters.
Article Synopsis
- - The paper focuses on creating high-magnetization porous silicon-based nanocomposites using a controlled method to synthesize ferromagnetic FeCo nanoparticles.
- - The process involves immersing porous silicon in a colloidal solution, with careful optimization of temperature, immersion time, and solvent type for effective results.
- - Characterization revealed a uniform filling of the pores and achieved a high magnetization level of 135 emu/cm, making these composites valuable for applications in data storage, medical devices, catalysis, and electronics.
RF performances of inductors integrated on localized p+-type porous silicon regions.
Nanoscale Res Lett
September 2012
To study the influence of localized porous silicon regions on radiofrequency performances of passive devices, inductors were integrated on localized porous silicon regions, full porous silicon sheet, bulk silicon and glass substrates. In this work, a novel strong, resistant fluoropolymer mask is introduced to localize the porous silicon on the silicon wafer. Then, the quality factors and resonant frequencies obtained with the different substrates are presented.
View Article and Find Full Text PDF