Transparent conducting Li (0-5 wt%) doped NiO thin films with preferential growth along the (111) plane were deposited onto glass substrates by pyrolytic decomposition of nickel nitrate and lithium chloride precursors at 500 °C in air. The effect of Li concentration on the structural, optical and transport properties of NiO thin films was studied by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), spectral transmittance, photoluminescence and linear four-probe resistivity. Activation energies as a function of Li concentration were deduced from the temperature dependent resistivity data measured in the range 300-448 K.
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