Soft-x-ray projection imaging with a 1:1 ring-field optic.

A molybdenum/silicon multilayer-coated 1:1 ring-field optic with a numerical aperture of 0.0835 is used to carry out soft-x-ray projection imaging with undulator radiation at 12.9 nm.

Characterization of AZ PN114 resist for soft-x-ray projection lithography.

Using 14-nm wavelength illumination, we have imaged 0.1-µm-wide lines and spaces in single-layer thin films of the highy sensitive, negative, chemically amplified resist AZ PN114 by usingboth a Schwarzschild 20× camera and an Offner ring field 1× optical system. For soft-x-ray projection lithography the approximate 0.

Mask technologies for soft-x-ray projection lithography at 13 nm.

We describe a variety of technologies for patterning transmissive and reflective soft x-ray projectionlithography masks containing features as small as 0.1 µm. The transmission masks fabricated for use at 13 nm are of one type, a Ge-absorbing layer patterned on a boron-doped Si membrane.

Design and fabrication of high-efficiency beam splitters and beam deflectors for integrated planar micro-optic systems.

High-frequency gratings with rectangular-groove profiles are used to generate high-efficiency beam splitters and beam deflectors. The effects of the grating design parameters, i.e.