Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet.

In this paper, the design of an efficient illuminator for extreme ultraviolet (EUV) applications such as photolithography, metrology, and microscopy is investigated. Illuminators are arrangements of optical components that allow us to tailor optical parameters to a targeted application. For the EUV spectral range, illuminators are commonly realized by an arrangement of several multilayer mirrors.

Automated lens design for optical systems consisting of stock lenses.

The design of lens systems requires advanced knowledge and the mastery of highly specialized software tools. Furthermore, for the realization of the designed lens systems often custom-made lenses are needed, which are expensive and have lead times of several weeks compared to stock lenses with several days. To shorten realization time, a new approach for the automated design of lens systems consisting of stock lenses is developed.

Rigorous approach for unifying wave optics and state of the art rendering techniques.

With the capabilities of diffractive optics there is a rising demand for determining the light interaction of diffractive elements with arbitrary illumination and scenery. Since the structured surfaces' scale lies within the visible wavelengths and below, the light's interaction cannot be simulated with state of the art geometric optic rendering approaches. This paper presents a new model for the inclusion of wave-optical effects into Monte Carlo path rendering concepts.

Freeform optics design for extended sources in paraxial approximation exploiting the expectation maximization algorithm.

Freeform optics generating specific irradiance distributions have been used in various applications for some time now. While most freeform optics design algorithms assume point sources or perfectly collimated light, the search for algorithms for non-idealized light sources with finite spatial as well as angular extent is still ongoing. In this work, such an approach is presented where the resulting irradiance distribution of a freeform optical surface is calculated as a superposition of pinhole images generated by points on the optical surface.

Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup.

The authors present a study on the dimensional characterization of nanoscale line gratings by spectroscopic reflectometry in the extreme ultraviolet spectral range (5 nm to 20 nm wavelength). The investigated grating parameters include the line height, the line width, the sidewall angle and corner radii. The study demonstrates that the utilization of shorter wavelengths in state-of-the-art optical scatterometry provides a high sensitivity with respect to the geometrical dimensions of nanoscale gratings.