High-resolution scanning electron microscopy study of sputtered nanolaminated Ti/TiN multilayers.

This work presents the morphologic and structural study of nanolaminated Ti/TiN multilayers using high-resolution scanning electron microscopy (HR-SEM), coupled to x-ray reflectometry (XRR). The multilayers have been deposited by reactive rf-sputtering on silicon substrates. For large period thickness (lambda=40 nm, 10 periods), in XRR, the low number of interfaces makes the interference less structured.

Tungsten/Magnesium silicide multilayers for soft x-ray optics.

W/Mg2Si multilayers for soft x-ray optics above the MgKα and MgLα lines have been deposited by RF sputtering. Their structural characteristics have been deduced from in situ kinetic ellipsometry, ex situ grazing x-ray reflection measurements, and high-resolution electron microscopy. Their soft x-ray performances have been measured by synchrotron radiation around the MgKα and MgLα lines and related to the structural characteristics.