Bandgap Restructuring of the Layered Semiconductor Gallium Telluride in Air.

A giant bandgap reduction in layered GaTe is demonstrated. Chemisorption of oxygen to the Te-terminated surfaces produces significant restructuring of the conduction band resulting in a bandgap below 0.8 eV, compared to 1.

Real-time observation of epitaxial graphene domain reorientation.

Graphene films grown by vapour deposition tend to be polycrystalline due to the nucleation and growth of islands with different in-plane orientations. Here, using low-energy electron microscopy, we find that micron-sized graphene islands on Ir(111) rotate to a preferred orientation during thermal annealing. We observe three alignment mechanisms: the simultaneous growth of aligned domains and dissolution of rotated domains, that is, 'ripening'; domain boundary motion within islands; and continuous lattice rotation of entire domains.

On demand shape-selective integration of individual vertical germanium nanowires on a Si(111) substrate via laser-localized heating.

Semiconductor nanowire (NW) synthesis methods by blanket furnace heating produce structures of uniform size and shape. This study overcomes this constraint by applying laser-localized synthesis on catalytic nanodots defined by electron beam lithography in order to accomplish site- and shape-selective direct integration of vertically oriented germanium nanowires (GeNWs) on a single Si(111) substrate. Since the laser-induced local temperature field drives the growth process, each NW could be synthesized with distinctly different geometric features.

Graphene Islands on Cu foils: the interplay between shape, orientation, and defects.

We have observed the growth of monolayer graphene on Cu foils using low-energy electron microscopy. On the (100)-textured surface of the foils, four-lobed, 4-fold-symmetric islands nucleate and grow. The graphene in each of the four lobes has a different crystallographic alignment with respect to the underlying Cu substrate.

Global faceting behavior of strained Ge islands on Si.

The evolution of crystallographic facets of strained heteroepitaxial Ge islands on Si is investigated. Islands growing on Si(001), (111), (110) and (113) are bound by an equilibrium set of facets that includes only shared stable surfaces between bulk Si and Ge--{105}, {113}, {15 3 23} and {111}. The formation of a stereographic map from these indices facilitates the prediction of Ge faceted-island shapes on any Si substrate at different stages of growth.

Gold-catalyzed oxide nanopatterns for the directed assembly of Ge island arrays on Si.

The heteroepitaxial growth of Ge on Au-patterned Si(001) is investigated using in situ spectromicroscopy. Patterning of a hydrogen-terminated Si surface with a square array of Au dots followed by brief exposure to air leads to the spontaneous, local oxidation of Si. The resulting oxide nanopattern limits the surface migration of Au during annealing up to 600 degrees C, resulting in complete preservation of the Au pattern.