Publications by Osamu Sone

Publications by authors named "Osamu Sone"

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[Fundamental Study on Artifacts and Displacement Force of Cosmetics Such as Eye Makeup in MRI Examinations].

Yukiko Hoshi Toshiki Tateishi Kunihiro Yabe Tomoyoshi Kimura Osamu Sone

Nihon Hoshasen Gijutsu Gakkai Zasshi

December 2024

Purpose: In MRI examinations, makeup cosmetics may cause image artifacts or be adsorbed by a static magnetic field. However, there are no reports on each cosmetic material ingredient. The purpose of this study was to evaluate the displacement force and image artifacts caused by cosmetic ingredients and to clarify the cosmetic ingredients that need to be removed.

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