Versatile multilevel soft lithography method with micrometer alignment using all-flexible rubber stamps and moiré fringe technique.

Soft lithography has gathered wide interest for the fabrication of unconventional micrometer and nanometer-sized structures and devices. Nevertheless, accurate alignment is essential to achieve multilevel soft lithography. Because of the soft nature of the stamp materials, such as soft polydimethylsiloxane, they are susceptible to mechanical distortions, which lower the registration accuracy.

Easy fabrication of electrically insulating nanogaps by transfer printing.

An easy and cost-effective method to reproducibly fabricate nanogaps over a large area is introduced. Gold is evaporated on low-aspect-ratio polydimethylsiloxane (PDMS) stamps at an angle of 60°. Afterwards, the stamp is brought into contact with a silicon/silicon dioxide substrate and subsequently peeled at rates varying from 1 to 3 mm s(-1), resulting in the fabrication of nanogaps between two gold electrodes.