This article describes the synthesis of nanosilica-cysteine composite (SiO2-Cys) and its application as a sorbent for arsenic(III) removal from different aqueous media. Attenuated total reflectance-Fourier-transform infrared spectroscopy, scanning and transmission electron microscopy, X-ray diffraction, and thermogravimetric analysis were applied to characterize SiO2-Cys. Using the batch technique, sorption of As(III) ion by SiO2-Cys was studied, and the effects of pH, sorbent dosage, temperature, initial concentration, and contact time were all taken into consideration.
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