Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency.

An extreme-ultraviolet radiation source based on a xenon pinch plasma is discussed with respect to the demands on a radiation source for extreme-ultraviolet lithography. Operation of the discharge in a self-igniting-plasma mode and omitting a switch permits a very effective and low-inductive coupling of the electrically stored energy to the electrode system. The xenon plasma exhibits broadband emission characteristics that offer radiation near 11 and 13 nm.

Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma.

An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a pseudosparklike electrode geometry, which allows for omitting a switch between the storage capacity and the electrode system and for low inductive coupling of the electrically stored energy to the plasma.