Growth of Hybrid Inorganic/Organic Chiral Thin Films by Sequenced Vapor Deposition.

One of the many challenges in the study of chiral nanosurfaces and nanofilms is the design of accurate and controlled nanoscale films with enantioselective activity. Controlled design of chiral nanofilms creates the opportunity to develop chiral materials with nanostructured architecture. Molecular layer deposition (MLD) is an advanced surface-engineering strategy for the preparation of hybrid inorganic-organic thin films, with a desired embedded property; in our study this is chirality.

Broadband luminescence in defect-engineered electrochemically produced porous Si/ZnO nanostructures.

The fabrication, by an all electrochemical process, of porous Si/ZnO nanostructures with engineered structural defects, leading to strong and broadband deep level emission from ZnO, is presented. Such nanostructures are fabricated by a combination of metal-assisted chemical etching of Si and direct current electrodeposition of ZnO. It makes the whole fabrication process low-cost, compatible with Complementary Metal-Oxide Semiconductor technology, scalable and easily industrialised.

Chiral Metal-Oxide Nanofilms by Cellulose Template Using Atomic Layer Deposition Process.

In this article, we describe an advance approach for the fabrication of chiral metal-oxide nanofilms. Our approach is based on the atomic layer deposition of titania and alumina nanofilms onto cellulose microfibers, used as chiral templates, leading to the formation of chiral nanofilms with a spatial fibrous structure. The chiral nanofilms were extensively characterized by X-ray photoelectron spectroscopy and high-resolution electron microscopy.