Fabrication of Specimens for Atom Probe Tomography Using a Combined Gallium and Neon Focused Ion Beam Milling Approach.

We demonstrate a new focused ion beam sample preparation method for atom probe tomography. The key aspect of the new method is that we use a neon ion beam for the final tip-shaping after conventional annulus milling using gallium ions. This dual-ion approach combines the benefits of the faster milling capability of the higher current gallium ion beam with the chemically inert and higher precision milling capability of the noble gas neon ion beam.

Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry.

Time of flight backscattering spectrometry (ToF-BS) was successfully implemented in a helium ion microscope (HIM). Its integration introduces the ability to perform laterally resolved elemental analysis as well as elemental depth profiling on the nm scale. A lateral resolution of ≤54nm and a time resolution of Δt≤17ns(Δt/t≤5.

Observation of synchronized atomic motions in the field ion microscope.

For over half a century, the field ion microscope (FIM) has been used to visualize atomic structures at the apex of a sharpened needle by way of the ion beams which are created at the most protruding atoms. In this paper we used a conventional FIM to study the emission characteristics of the neon ion beams produced within the FIM. The neon emission pattern is observed to be relatively short lived and subject to temporal and angular fluctuations.

Neon Ion Beam Lithography (NIBL).

Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence <1 ion/nm(2), ∼1000× more efficient than using 30 keV electrons, and resolution down to 7 nm half-pitch. This combination of resolution and exposure efficiency is expected to impact a wide array of fields that are dependent on beam-based lithography.

The prospects of a subnanometer focused neon ion beam.

The success of the helium ion microscope has encouraged extensions of this technology to produce beams of other ion species. A review of the various candidate ion beams and their technical prospects suggest that a neon beam might be the most readily achieved. Such a neon beam would provide a sputtering yield that exceeds helium by an order of magnitude while still offering a theoretical probe size less than 1-nm.

The history and development of the helium ion microscope.

The helium ion microscope has recently emerged as a commercially available instrument. However, its roots go back more than 60 years to the development of the field ion microscope in Berlin, first reported in 1951. Over the intervening years, numerous researchers have pursued the development of a gas field ionization source with the goal of producing a suitable source for an ion microscope.

Diffraction imaging in a He+ ion beam scanning transmission microscope.

The scanning helium ion microscope has been used in transmission mode to investigate both the feasibility of this approach and the utility of the signal content and the image information available. Operating at 40 keV the penetration of the ion beam, and the imaging resolution achieved, in MgO crystals was found to be in good agreement with values predicted by Monte Carlo modeling. The bright-field and annular dark-field signals displayed the anticipated contrasts associated with beam absorption and scattering.