Investigation of the Changes in Electronic Properties of Nickel Oxide (NiO) Due to UV/Ozone Treatment.

Drastic reduction in nickel oxide (NiO) film resistivity and ionization potential is observed when subjected to ultraviolet (UV)/ozone (O) treatment. X-ray photoemission spectroscopy suggests that UV/O treatment changes the film stoichiometry by introducing Ni vacancy defects. Oxygen-rich NiO having Ni vacancy defects behaves as a p-type semiconductor.