High-Resolution Lithographic Patterning with Organotin Films: Role of CO in Differential Dissolution Rates.

Details of the chemistry enabling the patterning of organotin photoresists to single-digit-nm resolution continue to engage study. In this report, we examine the contributions of atmospheric gases to the differential dissolution rates of an -butyltin oxide hydroxide photoresist. Cryo scanning tunneling electron microscopy (cryo-STEM) produces a micrograph of the latent image of an irradiated resist film, readily distinguishing exposed and unexposed regions.

Demonstration of Fowler-Nordheim Tunneling in Simple Solution-Processed Thin Films.

The production of high-quality thin-film insulators is essential to develop advanced technologies based on electron tunneling. Current insulator deposition methods, however, suffer from a variety of limitations, including constrained substrate sizes, limited materials options, and complexity of patterning. Here, we report the deposition of large-area AlO films by a solution process and its integration in metal-insulator-metal devices that exhibit I- V signatures of Fowler-Nordheim electron tunneling.

Alkyltin Keggin Clusters Templated by Sodium.

Dodecameric (Sn ) and hexameric topologies dominate monoalkyltin-oxo cluster chemistry. Their condensation, triggered by radiation exposure, recently produced unprecedented patterning performance in EUV lithography. A new cluster topology was crystallized from industrial n-BuSnOOH, and additional characterization techniques indicate other clusters are present.