The present work addresses the limitations by fabricating a wide range of negative electrodes, including metal nitrides/sulfides on a 3D bimetallic conductive porous network (3D-Ni and 3D-NiCo) via a dynamic hydrogen bubble template (DHBT) method followed by vapour phase growth (VPG) process. Among the prepared negative electrodes, the 3D-FeS-FeN/NiCo nanostructure demonstrates an impressive specific capacitance (C) of 1125 F g (2475 mF cm) at 1 A g with 80% capacitance retention over 5000 cycles. Similarly, a 3D-MnP nanostructured positive electrode fabricated via electrodeposition followed by a phosphorization process exhibits a maximum specific capacity (C) of 923.
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