Efficient Flame Retardant Thin Films Synthesized by Atmospheric Pressure PECVD through the High Co-deposition Rate of Hexamethyldisiloxane and Triethylphosphate on Polycarbonate and Polyamide-6 Substrates.

An innovative approach to produce high-performance and halogen-free flame-retardant thin films at atmospheric pressure is reported. PDMS-based coatings with embedded dopant-rich polyphosphates are elaborated thanks to a straightforward approach, using an atmospheric pressure dielectric barrier discharge (AP-DBD). Deposition conditions have been tailored to elaborate various thin films that can match the fire performance requirements.

Organosilicon coatings deposited in atmospheric pressure townsend discharge for gas barrier purpose: effect of substrate temperature on structure and properties.

Organosilicon plasma polymer and silicalike layers are deposited at different temperatures in a dielectric barrier discharge at atmospheric pressure operating in the Townsend regime. Final properties of these two kinds of layers can be finely tuned by the plasma process conditions. In particular, influence of deposition temperature is investigated when hexamethyldisiloxane based monolayers are deposited on poly(ethylene naphtalate) substrate.

Ultrasmooth silver thin film electrodes with high polar liquid wettability for OLED microcavity application.

For a lab-on-chip application, we fabricate a blue bottom emitting strong microcavity organic light emitting diode (OLED), using very smooth and optically thin (25 nm) silver film as anode on a glass substrate. To improve the hole injection in the OLED device, PEDOT-PSS (poly(3,4-ethylenedioxythiophene)-poly(styrene sulfonic acid)) has been used, so the silver anode must present not only a very smooth surface but also a strong adherence on the glass and a high wettability to allow a good PEDOT-PSS spin coating deposition. To obtain these physical properties, different 5 nm thick nucleation layers (germanium, chromium, and hydrogenated amorphous carbon) have been used to grow the silver thin films by e-beam deposition.