Protecting polymers in space with atomic layer deposition coatings.

Polymers in space may be subjected to a barrage of incident atoms, photons, and/or ions. Atomic layer deposition (ALD) techniques can produce films that mitigate many of the current challenges for space polymers. We have studied the efficacy of various ALD coatings to protect Kapton polyimide, FEP Teflon, and poly(methyl methacrylate) films from atomic-oxygen and vacuum ultraviolet (VUV) attack.

Erosion of FEP Teflon and PMMA by VUV radiation and hyperthermal O or Ar atoms.

A combination of beam-surface-scattering, quartz-crystal-microbalance, and surface-recession experiments was conducted to study the effects of various combinations of O atoms [in the O((3)P) ground state], Ar atoms, and vacuum ultraviolet (VUV) light on fluorinated ethylene-propylene copolymer (FEP) Teflon and poly(methyl methacrylate) (PMMA). A laser-breakdown source was used to create hyperthermal beams containing O and O(2) or Ar. A D(2) lamp provided a source of VUV light.

Optical spectroscopy of RuC: 18,000-24,000 cm(-1).

The optical spectrum of diatomic RuC has been recorded from 17 800 to 24 200 cm(-1). Three previously unidentified excited electronic states were analyzed and identified as having Omega' = 0, Omega' = 2, and Omega' = 3. The Omega' = 3 state was determined to be a 3Delta3 state that is suggested to arise from a mixture of the 10sigma(2)11sigma(2)5pi(3)2delta(3)12sigma(1)6pi(1) and 10sigma(2)11sigma(1)5pi(3)2delta(3)12sigma(2)6pi(1) electronic configurations.