Direct Patterning of Optoelectronic Nanostructures Using Encapsulated Layered Transition Metal Dichalcogenides.

Direct top-down nanopatterning of semiconductors is a powerful tool for engineering properties of optoelectronic devices. Translating this approach to two-dimensional semiconductors such as monolayer transition metal dichalcogenides (TMDs) is challenging because of both the small scales required for confinement and the degradation of electronic and optical properties caused by high-energy and high-dose electron radiation used for high-resolution top-down direct electron beam patterning. We show that encapsulating a TMD monolayer with hexagonal boron nitride preserves the narrow exciton linewidths and emission intensity typical in such heterostructures after electron beam lithography, allowing direct patterning of functional optical monolayer nanostructures on scales of a few tens of nanometers.

Electrical Control of Circular Photogalvanic Spin-Valley Photocurrent in a Monolayer Semiconductor.

In a monolayer transition metal dichalcogenide (TMDC) that lacks structural inversion symmetry, spin degeneracy is lifted by strong spin-orbit coupling, and a distinctive spin-valley locking allows for the creation of valley-locked spin-polarized carriers with a circularly polarized optical excitation. When excited carriers also have net in-plane momentum, spin-polarized photocurrents can be generated at ambient temperature without magnetic fields or materials. The behavior of these spin-polarized photocurrents in monolayer TMDC remains largely unexplored.

Intrinsic Transport in 2D Heterostructures Mediated through h-BN Tunneling Contacts.

Understanding the electronic transport of monolayer transition metal dichalcogenides (TMDs) and their heterostructures is complicated by the difficulty in achieving electrical contacts that do not perturb the material. Typically, metal deposition on monolayer TMDs leads to hybridization between the TMD and the metal, which produces Schottky barriers at the metal/semiconductor interface. In this work, we apply the recently reported hexagonal boron nitride (h-BN) tunnel contact scheme to probe the junction characteristics of a lateral TMD heterostructure grown via chemical vapor deposition.